Arborescencia de Cobre en Electrodeposición: Modelos Experimentales y Computacionales

Abstract

Experimental and computational results of ramified copper electrodeposits in thin plane cells are described. Varying concentration and chemical perturbations of the electrolyte, cell thickness and voltage applied between electrodes, many different morphologies are found. A brief outline of theoretical and computational models describing experiments is presented. This work attempts to shed some light into the complex process of electrohydrodynamic instabilities.